InxGa1-xN Template Substrates
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Typical parameters of InxGa1-xN layers
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FWHM of |
Thickness, microns |
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0.05-0.2 |
<900 |
0.02-0.5 |
For GaN
on sapphire template parameters see our standard specification
Fabrication method: hydride vapor phase epitaxy (HVPE)
X-ray diffraction spectrum (a) and
-scan rocking curve (b)
measured for InGaN layer grown on GaN/Sapphire
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(a) |
(b) |
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